Microstructure and Properties of ITO and ITO/Ag/ITO Multilayer Thin Films Prepared by D.C. Magnetron Sputtering
نویسندگان
چکیده
منابع مشابه
CrNx Films Prepared by DC Magnetron Sputtering and High-Power Pulsed Magnetron Sputtering: A Comparative Study
CrNx (0 ≤ x ≤ 0.91) films synthesized using highpower pulsed magnetron sputtering, also known as high-power impulse magnetron sputtering (HiPIMS), have been compared with those made by conventional direct-current (dc) magnetron sputtering (DCMS) operated at the same average power. The HiPIMS deposition rate relative to the DCMS rate was found to decrease linearly with increasing emission streng...
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Crystalline tantalum thin films of about 500nm thickness were deposited on AISI 316L stainless steel substrate using magnetron sputtering. To investigate the nano-mechanical properties of tantalum films, deposition was performed at two temperatures (25°C and 200°C) on TaNx intermediate layer with different N2/Ar flow rate ratio from 0 to 30%. Nano-indentation was performed to obtain the mechani...
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M.K.M. ALI , K. IBRAHIM , OSAMA S HAMAD , M.H. EISA , M.G. FARAJ , and F. AZHARI 1 School of Physics, University Sains Malaysia, Penang 11800, Malaysia Department of Physics, College of Science, Sudan University of Science and Technology, Khartoum 11113, Sudan School of Electrical and Electronic Engineering, University Sains Malaysia, Penang 11800, Malaysia E-mail: [email protected], kamarul@...
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Sputter deposition process is another old technique being used in modern semiconductor industries. Sputtering is a process that can deposit TiO2 material on wafer/glass substrates. In this process target is connected to negative high voltage. Further argon gas is introduced into the chamber and is ionized to a positive charge. The positively charged argon atoms are attracted and strike the nega...
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ژورنال
عنوان ژورنال: Korean Journal of Materials Research
سال: 2006
ISSN: 1225-0562
DOI: 10.3740/mrsk.2006.16.8.490